共 9 条
[1]
INSITU CLEANING OF SILICON SUBSTRATE SURFACES BY REMOTE PLASMA-EXCITED HYDROGEN
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1989, 7 (04)
:621-626
[3]
ASHING OF ION-IMPLANTED RESIST LAYER
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1989, 28 (10)
:2130-2136
[4]
RESIST STRIPPING IN AN O2 + H2O PLASMA DOWNSTREAM
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1991, 9 (02)
:357-361
[7]
KIKUCHI J, IN PRESS P MICROELEC
[8]
OHYA H, 1989, DENSHI SUPIN KYOMEI, P59
[9]
RONY PR, 1966, CHEM PHYS, V44, P2536