CHEMICAL AND STRUCTURAL-PROPERTIES OF THE PD-SI INTERFACE DURING THE INITIAL-STAGES OF SILICIDE FORMATION

被引：68

作者：

HO, PS

TAN, TY

LEWIS, JE

RUBLOFF, GW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 05期

关键词：

D O I：

10.1116/1.570171

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1120 / 1124

页数：5

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