STRUCTURE AND PROPERTIES OF NI-TIC CERMET FILMS FORMED BY ION PLATING

被引：6

作者：

ISHIDA, A

OGAWA, K

KIMURA, T

TAKEI, A

机构：

[1] National Research Institute for Metals, Meguroku, Tokyo, 2-3-12, Nakameguro

来源：

THIN SOLID FILMS | 1990年 / 191卷 / 01期

关键词：

D O I：

10.1016/0040-6090(90)90275-I

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

NiTiC cermet films with Ti:Ni ratios of 0.35 and 3 were deposited by activated reactive evaporation. Electron microscopy study revealed that the films were fine-grained mixtures of nickel and TiC. Among them a nickel-rich cermet film exhibited good adhesion, high hardness and high ductility. © 1990.

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页码：69 / 76

页数：8

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