PROCESS MONITORING OF A-C-H PLASMA DEPOSITION

被引：54

作者：

WILD, C

WAGNER, J

KOIDL, P

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574962

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2227 / 2230

页数：4

共 10 条

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[5] DIAGNOSTICS AND MODELING OF A METHANE PLASMA USED IN THE CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-CARBON FILMS [J].

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URANO, Y .

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[6] OPTICAL STUDIES OF HYDROGENATED AMORPHOUS-CARBON PLASMA DEPOSITION [J].

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[7]

WAGNER J, 1986, MATER RES SOC S P, V68, P205

[8]

WILD CM, IN PRESS

[9]

WINTER J, 1986, IN PRESS 7TH P INT C

[10]

Woollam J. A., 1985, Applied Physics Communications, V5, P263

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