MOSSBAUER-SPECTROSCOPY INVESTIGATION OF THE DX-CENTER IN TE-IMPLANTED ALXGA1-XAS

被引:5
作者
BEMELMANS, H [1 ]
BORGHS, G [1 ]
LANGOUCHE, G [1 ]
机构
[1] INTERUNIV INST MICROELECTR,B-3001 LOUVAIN,BELGIUM
关键词
D O I
10.1016/0168-583X(92)95186-U
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Mossbauer measurements were performed on AlxGa1-xAs implanted with Te-129m isotopes. A defect configuration, which is characterized by a large electric field gradient, is observed in these measurements. This defect configuration shows persistent photoionisation and we can associate it with the so-called "DX-center". This persistent photoionisation and the time constant of the relaxation from the DX-center defect site, after the light is turned off, are measured by Mossbauer spectroscopy.
引用
收藏
页码:151 / 153
页数:3
相关论文
共 7 条
[1]   MOSSBAUER STUDY OF THE DEFECT STRUCTURES AROUND TE IMPLANTED IN ALXGA1-XAS [J].
BEMELMANS, H ;
BORGHS, G ;
LANGOUCHE, G .
HYPERFINE INTERACTIONS, 1990, 56 (1-4) :1553-1556
[2]   THEORY OF THE ATOMIC AND ELECTRONIC-STRUCTURE OF DX CENTERS IN GAAS AND ALXGA1-XAS ALLOYS [J].
CHADI, DJ ;
CHANG, KJ .
PHYSICAL REVIEW LETTERS, 1988, 61 (07) :873-876
[3]   TRAPPING CHARACTERISTICS AND A DONOR-COMPLEX (DX) MODEL FOR THE PERSISTENT PHOTOCONDUCTIVITY TRAPPING CENTER IN TE-DOPED ALXGA1-XAS [J].
LANG, DV ;
LOGAN, RA ;
JAROS, M .
PHYSICAL REVIEW B, 1979, 19 (02) :1015-1030
[4]  
LANG DV, 1977, PHYS REV LETT, V39, P634
[5]  
LANG DV, 1986, DEEP CTR SEMICONDUCT, pCH7
[6]  
Langouche G., 1989, Materials Science Forum, V38-41, P1245, DOI 10.4028/www.scientific.net/MSF.38-41.1245
[7]  
LANGOUCHE G, 1988, MATER RES SOC S P, V104, P527