RELATION BETWEEN OPTICAL PROPERTY AND CRYSTALLINITY OF ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING

被引:83
作者
TAKADA, S
机构
[1] Department of Electronic Engineering, Tokyo Denki University, Chiyoda-ku
关键词
D O I
10.1063/1.354091
中图分类号
O59 [应用物理学];
学科分类号
摘要
ZnO (zinc oxide) thin films have been prepared by using rf magnetron sputtering on a SiO2/Si substrate. The crystallographic properties and optical properties were investigated. It is shown that the ZnO films exhibit strong c-axis orientation. The standard deviation of the c axis was obtained less than 1-degrees. The optical propagation loss was less than 2 dB/cm (TE0 mode) in a 0.6-mum-thick film. To achieve the ZnO films with low light propagation loss, it was found that we must take into account not only c-axis orientation of ZnO films but also the density of ZnO films.
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页码:4739 / 4742
页数:4
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