ELECTRICAL CHARACTERISTICS OF BARIUM-TITANATE FILMS PREPARED BY LASER-ABLATION

被引:37
作者
YEH, MH
LIU, YC
LIU, KS
LIN, IN
LEE, JYM
CHENG, HF
机构
[1] NATL TSING HUA UNIV,DEPT ELECT ENGN,HSINCHU 30043,TAIWAN
[2] NATL TSING HUA UNIV,CTR MAT SCI,HSINCHU 30043,TAIWAN
[3] NATL TAIWAN NORMAL UNIV,DEPT PHYS,TAIPEI 117,TAIWAN
关键词
D O I
10.1063/1.354744
中图分类号
O59 [应用物理学];
学科分类号
摘要
The BaTiO3 ferroelectric films of quality suitable for applying as dielectrics in 64 and 256 Mb dynamic random access memory have been successfully synthesized using the laser ablation technique. The dielectric constant and dielectric strength of the films are epsilon = 200 and 1 MV/cm, respectively. The switching characteristics are Q(c)=0.66 muc/cm2, t(s)=0.1 ps, and J1=1.57 muA/cm2 at 2.5 V, for charge storage density, writing time, and leakage current density, respectively. The quality of the BaTiO3 films is Superior to the Ta2O5 dielectric films and is comparable to the lead-zirconate-titanate ferroelectric films.
引用
收藏
页码:2143 / 2145
页数:3
相关论文
共 7 条
[1]   ELECTRICAL AND RELIABILITY PROPERTIES OF PZT THIN-FILMS FOR ULSI DRAM APPLICATIONS [J].
CARRANO, J ;
SUDHAMA, C ;
CHIKARMANE, V ;
LEE, J ;
TASCH, A ;
SHEPHERD, W ;
ABT, N .
IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, 1991, 38 (06) :690-703
[2]  
CHEN IC, 1985, IEEE T ELECTRON DEV, V32, P413, DOI 10.1109/T-ED.1985.21957
[3]   EFFECTS OF BEAM PARAMETERS ON EXCIMER LASER DEPOSITION OF YBA2CU3O7-DELTA [J].
MUENCHAUSEN, RE ;
HUBBARD, KM ;
FOLTYN, S ;
ESTLER, RC ;
NOGAR, NS ;
JENKINS, C .
APPLIED PHYSICS LETTERS, 1990, 56 (06) :578-580
[4]   PROMISING STORAGE CAPACITOR STRUCTURES WITH THIN TA2O5 FILM FOR LOW-POWER HIGH-DENSITY DRAMS [J].
SHINRIKI, H ;
KISU, T ;
KIMURA, S ;
NISHIOKA, Y ;
KAWAMOTO, Y ;
MUKAI, K .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (09) :1939-1947
[5]   UV-O3 AND DRY-O2 - 2-STEP ANNEALED CHEMICAL VAPOR-DEPOSITED TA2O5 FILMS FOR STORAGE DIELECTRICS OF 64-MB DRAMS [J].
SHINRIKI, H ;
NAKATA, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (03) :455-462
[6]   MEMORY CELL AND TECHNOLOGY ISSUES FOR 64-MBIT AND 256-MBIT ONE-TRANSISTOR CELL MOS DRAMS [J].
TASCH, AF ;
PARKER, LH .
PROCEEDINGS OF THE IEEE, 1989, 77 (03) :374-388
[7]  
IEEE CIRCUITS DEVICE