DESIGN OF PLASMA-ETCHING AND DEPOSITION SYSTEMS

被引：9

作者：

KUMAGAI, HY

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573943

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1800 / 1804

页数：5

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[5]

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[9]

OKANO H, 1982, SOLID STATE TECHNOL, V25, P166

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