SELENIUM IMPLANTATION INTO SILICON STUDIED BY DLTS TECHNIQUE

被引:27
作者
RICHOU, F [1 ]
PELOUS, G [1 ]
LECROSNIER, D [1 ]
机构
[1] CTR NATL ETUD TELECOMMUN,F-22301 LANNION,FRANCE
关键词
D O I
10.1063/1.89763
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:525 / 527
页数:3
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