SPUTTERING DEPOSITION, XPS AND X-RAY-DIFFRACTION CHARACTERIZATION OF OXYGEN-PLATINUM COMPOUNDS

被引：30

作者：

HECQ, M ^{[1
]}

HECQ, A ^{[1
]}

DELRUE, JP ^{[1
]}

ROBERT, T ^{[1
]}

机构：

[1] FAC MED MONS,CHIM GEN LAB,B-7000 MONS,BELGIUM

来源：

JOURNAL OF THE LESS-COMMON METALS | 1979年 / 64卷 / 02期

关键词：

D O I：

10.1016/0022-5088(79)90185-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin films of oxygen-platinum compounds have been prepared by reactive sputtering and investigated mainly by X-ray diffraction and photoelectron spectroscopy. As a result of this study, platinum oxide films such as PtO and PtO2 were obtained by adjustment of the deposition rate and the chemical composition of the gaseous phase. In addition, a new phase with an intermediate oxidation state between PtO and PtO2 was observed. Binding energies and intensities of platinum core lines and valence bands as well as oxygen 1s lines are discussed in connection with stoichiometry and chemical bonding in these compounds. © 1979.

引用

页码：P25 / P37

页数：13

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