INTERPLAY OF BERYLLIUM SEGREGATION AND DIFFUSION IN HEAVILY DOPED GAAS AND ALGAAS GROWN BY MOLECULAR-BEAM EPITAXY (THERMODYNAMIC ANALYSIS)

被引:24
作者
IVANOV, SV
KOPEV, PS
LEDENTSOV, NN
机构
[1] A.F. Ioffe Physico-Technical Institute, Academy of Sciences, the USSR, Leningrad, 194021
关键词
D O I
10.1016/0022-0248(91)90246-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A close connection between Be surface segregation and diffusion in MBE GaAs and AlGaAs layers heavily doped with Be is analyzed in the framework of the thermodynamic approach to segregation effects in MBE developed earlier and the simple interstitial-substitutional diffusion model. A good agreement between theoretical and experimental results allows us to suggest that the main origin of the extremely fast Be in-diffusion in GaAs: Be and the deterioration of its surface morphology and luminescence properties is the Be surface segregation resulting in the near-surface solid phase layer enrichment with Be compared to bulk GaAs: Be. The influence of growth parameters (arsenic excess pressure, substrate temperature, growth rate) and doping level on the possibility of beryllium segregation layer formation is discussed.
引用
收藏
页码:661 / 669
页数:9
相关论文
共 27 条
[1]   BE INCORPORATION IN HEAVILY DOPED MOLECULAR-BEAM EPITAXY GROWN GAAS - EVIDENCE OF NONRADIATIVE BEHAVIOR BY CATHODOLUMINESCENCE AND ELECTRON ACOUSTIC MEASUREMENTS [J].
BRESSE, JF ;
PAPADOPOULO, AC .
APPLIED PHYSICS LETTERS, 1987, 51 (03) :183-185
[2]   INFLUENCE OF GROWTH TEMPERATURE ON BE INCORPORATION IN MOLECULAR-BEAM EPITAXY GAAS EPILAYERS [J].
DUHAMEL, N ;
HENOC, P ;
ALEXANDRE, F ;
RAO, EVK .
APPLIED PHYSICS LETTERS, 1981, 39 (01) :49-51
[3]  
ENQUIST P, 1985, J APPL PHYS, V58, P4310
[4]  
FOXON CT, 1978, ACTA ELECTRON, V21, P139
[5]   MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J].
FRANK, FC ;
TURNBULL, D .
PHYSICAL REVIEW, 1956, 104 (03) :617-618
[6]   DOPING CHARACTERISTICS AND ELECTRICAL-PROPERTIES OF BE-DOPED P-TYPE ALXGA1-XAS BY LIQUID-PHASE EPITAXY [J].
FUJITA, S ;
BEDAIR, SM ;
LITTLEJOHN, MA ;
HAUSER, JR .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) :5438-5444
[7]   REVISED CALCULATION OF POINT-DEFECT EQUILIBRIA AND NONSTOICHIOMETRY IN GALLIUM-ARSENIDE [J].
HURLE, DTJ .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1979, 40 (08) :613-626
[9]   BERYLLIUM DOPING AND DIFFUSION IN MOLECULAR-BEAM EPITAXY OF GAAS AND ALXGA1-XAS [J].
ILEGEMS, M .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) :1278-1287
[10]   THERMODYNAMIC ANALYSIS OF SEGREGATION EFFECTS IN MOLECULAR-BEAM EPITAXY [J].
IVANOV, SV ;
KOPEV, PS ;
LEDENTSOV, NN .
JOURNAL OF CRYSTAL GROWTH, 1990, 104 (02) :345-354