FILAMENTARY THERMAL BREAKDOWN IN THIN DIELECTRICS

被引：11

作者：

SHOUSHA, AHM

YOUNG, L

PULFREY, DL

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 01期

关键词：

D O I：

10.1063/1.1660800

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：15 / &

共 10 条

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[3] INTERPRETATION OF DESTRUCTIVE BREAKDOWN IN THIN DIELECTRIC FILMS [J].

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[4]

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[5]

Carslaw H. S., 1959, CONDUCTION HEAT SOLI

[6]

DELLOCA CJ, 1971, PHYS THIN FILMS, V6, P1, DOI DOI 10.1016/B978-0-12-533006-0.50008-6

[7] ELECTRICAL PULSE BREAKDOWN OF SILICON OXIDE FILMS [J].

KLEIN, N ;

BURSTEIN, E .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (07) :2728-+

[8] ELECTRICAL BREAKDOWN IN THIN DIELECTRIC FILMS [J].

KLEIN, N .

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[9]

ODWYER JJ, 1964, THEORY DIELECTRIC BR

[10] ELECTRONIC CONDUCTION AND SPACE CHARGE IN AMORPHOUS INSULATING FILMS [J].

PULFREY, DL ;

SHOUSHA, AHM ;

YOUNG, L .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (07) :2838-&

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