OPTICAL FUNCTIONS OF CHEMICAL-VAPOR-DEPOSITED THIN-FILM SILICON DETERMINED BY SPECTROSCOPIC ELLIPSOMETRY

被引:240
作者
JELLISON, GE
CHISHOLM, MF
GORBATKIN, SM
机构
[1] Solid State Division, Oak Ridge National Laboratory, Oak Ridge
关键词
D O I
10.1063/1.109067
中图分类号
O59 [应用物理学];
学科分类号
摘要
The optical functions of several forms of thin-film silicon (amorphous Si, fine-grain polycrystalline Si, and large-grain polycrystalline Si) grown on oxidized Si have been determined using 2-channel spectroscopic polarization modulation ellipsometry from 240 to 840 nm (approximately 1.5-5.2 eV). It is shown that the standard technique for simulating the optical functions of polycrystalline silicon (an effective medium consisting of crystalline Si, amorphous Si, and voids) does not fit the ellipsometry data.
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页码:3348 / 3350
页数:3
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