SURFACE STRESS AS A DRIVING FORCE FOR INTERFACIAL MIXING

被引：53

作者：

TROMP, RM

VANDERGON, AWD

REUTER, MC

机构：

[1] IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY 10598

来源：

PHYSICAL REVIEW LETTERS | 1992年 / 68卷 / 15期

关键词：

D O I：

10.1103/PhysRevLett.68.2313

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Displacive adsorption of As on vicinal Si(001) surfaces has in the past been attributed to reduction of step-related (extrinsic) surface stress. Here we show images of As adsorption on flat Si(001), obtained with in situ low-energy electron microscopy, and with scanning tunneling microscopy. We find displacive adsorption even on micron-size terraces, on which steps play no significant role. These new results reveal the role of intrinsic surface stress as a driving force for interfacial mixing.

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页码：2313 / 2316

页数：4

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