ETCHING FRONT CONTROL OF (110) STRIPS FOR CORNER COMPENSATION

被引：56

作者：

BAO, M

BURRER, C

ESTEVE, J

BAUSELLS, J

MARCO, S

机构：

[1] Centre Nacional de Microelectrònica (CSIC), 08193 Bellaterra, Barcelona, Campus Universitad Autonoma Barcelona

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1993年 / 37-8卷

关键词：

D O I：

10.1016/0924-4247(93)80123-X

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper a scheme of convex corner compensation for etching in aqueous KOH using only [110] strips is presented. Turns and branches are used to control the etching front on the strip surface for better compensation quality. The design rules as well as the effects of turning and branching on the effective compensation length are presented. The etching fronts on the bottom are investigated by experiment. Applications of the new structures are shown.

引用

页码：727 / 732

页数：6

共 7 条

[1] CORNER UNDERCUTTING IN ANISOTROPICALLY ETCHED ISOLATION CONTOURS [J].