PICOSECOND REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION

[1] LOW-ENERGY ELECTRON-DIFFRACTION DURING PULSED LASER ANNEALING - A TIME-RESOLVED SURFACE STRUCTURAL STUDY [J]. PHYSICAL REVIEW LETTERS, 1984, 52 (04) : 307 - 310

[2] ULTRAFAST HEATING OF SILICON ON SAPPHIRE BY FEMTOSECOND OPTICAL PULSES [J]. PHYSICAL REVIEW LETTERS, 1986, 56 (07) : 761 - 764

[3] KILOHERTZ SYNCHRONOUS AMPLIFICATION OF 85-FEMTOSECOND OPTICAL PULSES [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1985, 2 (04) : 616 - 618

[4] TIME-RESOLVED OBSERVATION OF ELECTRON-PHONON RELAXATION IN COPPER [J]. PHYSICAL REVIEW LETTERS, 1987, 58 (12) : 1212 - 1215

[5] FEMTOSECOND STREAK TUBE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (06) : 932 - 938

[6] Nanosecond resolution time-resolved x-ray study of silicon during pulsed-laser irradiation [J]. JOURNAL OF MATERIALS RESEARCH, 1986, 1 (01) : 144 - 154

[7] PICOSECOND TIME-RESOLVED PLASMA AND TEMPERATURE-INDUCED CHANGES OF REFLECTIVITY AND TRANSMISSION IN SILICON [J]. APPLIED PHYSICS LETTERS, 1982, 41 (07) : 643 - 646

[8] PULSED NEODYMIUM - YTTRIUM ALUMINUM GARNET LASER (532 NM) MELTING OF CRYSTALLINE SILICON - EXPERIMENT AND THEORY [J]. APPLIED PHYSICS LETTERS, 1983, 43 (03) : 258 - 260

[9] MOUROU G, 1982, LASER FOCUS WORLD, V18, P97

[10] A PICOSECOND JITTER STREAK CAMERA [J]. APPLIED PHYSICS LETTERS, 1980, 36 (08) : 623 - 626

[1] LOW-ENERGY ELECTRON-DIFFRACTION DURING PULSED LASER ANNEALING - A TIME-RESOLVED SURFACE STRUCTURAL STUDY [J]. PHYSICAL REVIEW LETTERS, 1984, 52 (04) : 307 - 310

[2] ULTRAFAST HEATING OF SILICON ON SAPPHIRE BY FEMTOSECOND OPTICAL PULSES [J]. PHYSICAL REVIEW LETTERS, 1986, 56 (07) : 761 - 764

[3] KILOHERTZ SYNCHRONOUS AMPLIFICATION OF 85-FEMTOSECOND OPTICAL PULSES [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1985, 2 (04) : 616 - 618

[4] TIME-RESOLVED OBSERVATION OF ELECTRON-PHONON RELAXATION IN COPPER [J]. PHYSICAL REVIEW LETTERS, 1987, 58 (12) : 1212 - 1215

[5] FEMTOSECOND STREAK TUBE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (06) : 932 - 938

[6] Nanosecond resolution time-resolved x-ray study of silicon during pulsed-laser irradiation [J]. JOURNAL OF MATERIALS RESEARCH, 1986, 1 (01) : 144 - 154

[7] PICOSECOND TIME-RESOLVED PLASMA AND TEMPERATURE-INDUCED CHANGES OF REFLECTIVITY AND TRANSMISSION IN SILICON [J]. APPLIED PHYSICS LETTERS, 1982, 41 (07) : 643 - 646

[8] PULSED NEODYMIUM - YTTRIUM ALUMINUM GARNET LASER (532 NM) MELTING OF CRYSTALLINE SILICON - EXPERIMENT AND THEORY [J]. APPLIED PHYSICS LETTERS, 1983, 43 (03) : 258 - 260

[9] MOUROU G, 1982, LASER FOCUS WORLD, V18, P97

[10] A PICOSECOND JITTER STREAK CAMERA [J]. APPLIED PHYSICS LETTERS, 1980, 36 (08) : 623 - 626