EFFECT OF ATOMIC SUBSTRATE SURFACE MOBILITY ON THE NUCLEATION AND ISLAND GROWTH OF THIN-FILMS

被引：6

作者：

XU, S ^{[1
]}

LU, GQ ^{[1
]}

机构：

[1] NANYANG TECHNOL UNIV,SCH MECH & PROD ENGN,SINGAPORE 2263,SINGAPORE

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1994年 / 13卷 / 22期

关键词：

D O I：

10.1007/BF00704522

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：1629 / 1631

页数：3

共 17 条

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