MONTE-CARLO SIMULATION OF FAST SECONDARY-ELECTRON PRODUCTION IN ELECTRON-BEAM RESISTS

被引：163

作者：

MURATA, K

KYSER, DF

TING, CH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 07期

关键词：

D O I：

10.1063/1.329366

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4396 / 4405

页数：10

共 60 条

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