LINE-PROFILES IN THICK ELECTRON RESIST LAYERS AND PROXIMITY EFFECT CORRECTION

被引：14

作者：

PHANG, JCH

AHMED, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570287

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1754 / 1758

页数：5

共 11 条

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[3]

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[6]

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[7] MONTE-CARLO SIMULATION OF SPATIALLY DISTRIBUTED BEAMS IN ELECTRON-BEAM LITHOGRAPHY [J].

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[8] SELF-CONSISTENT PROXIMITY EFFECT CORRECTION TECHNIQUE FOR RESIST EXPOSURE (SPECTER) [J].

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[9]

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[10]

PHANG JCH, 1979, THESIS U CAMBRIDGE

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