MONTE-CARLO SIMULATION OF SPATIALLY DISTRIBUTED BEAMS IN ELECTRON-BEAM LITHOGRAPHY

被引：96

作者：

KYSER, DF

VISWANATHAN, NS

机构：

[1] IBM CORP,RES DIV,SAN JOSE,CA 95193

[2] IBM CORP,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568524

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1305 / 1308

页数：4

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