DISSOCIATIVE DIFFUSION OF NICKEL IN SILICON AND SELF-DIFFUSION OF SILICON

被引：102

作者：

YOSHIDA, M

SAITO, K

机构：

来源：

关键词：

D O I：

10.1143/JJAP.6.573

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：573 / &

共 24 条

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