CHEMICAL VAPOR-DEPOSITION OF BORON AND BORON-NITRIDE FROM DECABORANE(14)

被引:28
作者
KIM, YG
DOWBEN, PA
SPENCER, JT
RAMSEYER, GO
机构
[1] GE,ELECTR LAB,SYRACUSE,NY 13221
[2] SYRACUSE UNIV,DEPT CHEM,SYRACUSE,NY 13244
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期
关键词
D O I
10.1116/1.576181
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2796 / 2798
页数:3
相关论文
共 45 条
[1]   CHARACTERIZATION OF FILMS FORMED BY PYROLYSIS OF BORAZINE [J].
ADAMS, AC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (06) :1378-1379
[2]   CHEMICAL-DEPOSITION OF BORON-NITROGEN FILMS [J].
ADAMS, AC ;
CAPIO, CD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (02) :399-405
[3]  
AND MJ, 1979, J VAC SCI TECHNOL, V160, P420
[4]   OPTICAL PROPERTIES OF THIN BORON NITRIDE FILMS [J].
BARONIAN, W .
MATERIALS RESEARCH BULLETIN, 1972, 7 (02) :119-&
[5]  
Basche M., 1964, U.S. Pat., Patent No. [3, 152, 006, 3152006]
[6]  
BEALE HA, 1983, Patent No. 4415420
[7]  
BEALE HA, 1987, Patent No. 4655893
[8]  
BEALE HA, 1981, Patent No. 429738
[9]  
BEALE HA, 1981, Patent No. 4297387
[10]  
BEALE HA, 1983, Patent No. 4412899