ELECTRICAL RESISTIVITIES OF DIAMOND-LIKE CARBON

被引：46

作者：

GRILL, A

PATEL, V

COHEN, S

机构：

[1] IBM Research Division, T.J. Watson Research Center, Yorktown Heights

来源：

关键词：

D O I：

10.1016/0925-9635(94)90093-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Electrical resistivities of diamond-like carbon films deposited by d.c. plasma-assisted chemical vapor deposition have been investigated in electric fields up to 3 x 10(6) V cm-1. The films displayed a non-ohmic behavior, with the resistivities decreasing with increasing electric field. Differences of several orders of magnitude have been observed between the resistivities of films deposited from different precursors at identical plasma conditions, with the largest resistivities in excess of 10(16) Omega.cm obtained for films deposited from cyclohexane. The breakdown fields have been found to be larger than 3 x 10(6) V cm(-1) for all films studied.

引用

页码：281 / 284

页数：4

共 17 条

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