STRUCTURE-ANALYSIS OF SILICON DIOXIDE FILMS FORMED BY OXIDATION OF SILANE

被引：52

作者：

NAGASIMA, N

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 08期

关键词：

D O I：

10.1063/1.1661723

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3378 / &

相关论文

共 39 条

[1] BARRY ML, 1970, CHEMICAL VAPOR DEPOS, P595
[2] BAUER SH, 1960, NONCRYSTALLINE SOLID, P53
[3] EFFECT OF ULTRAVIOLET IRRADIATION ON OPTICAL PROPERTIES OF SILICON OXIDE FILMS
BRADFORD, AP
HASS, G
MCFARLAND, M
RITTER, E
[J]. APPLIED OPTICS, 1965, 4 (08) : 971 - +
[4] INCREASING FAR-ULTRAVIOLET REFLECTANCE OF SILICON-OXIDE-PROTECTED ALUMINUM MIRRORS BY ULTRAVIOLET IRRADIATION
BRADFORD, AP
HASS, C
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1963, 53 (09) : 1096 - +
[5] INFLUENCE OF NEGLECTED SMALL-ANGLE SCATTERING IN RADIAL DISTRIBUTION FUNCTION ANALYSIS
CARGILL, GS
[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1971, 4 (AUG1) : 277 - &
[6] STRUCTURAL INVESTIGATION OF NONCRYSTALLINE NICKEL-PHOSPHORUS ALLOYS
CARGILL, GS
[J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (01) : 12 - &
[7] CHU TL, 1968, T METALL SOC AIME, V242, P532
[8] STRUCTURE OF SILICON OXIDE FILMS
COLEMAN, MV
THOMAS, DJD
[J]. PHYSICA STATUS SOLIDI, 1967, 22 (02): : 593 - &
[9] ELECTRON DIFFRACTION AT LOW TEMPERATURE .2. RADIAL DISTRIBUTION ANALYSIS OF METASTABLE STRUCTURE OF METAL FILMS PREPARED BY LOW TEMPERATURE CONDENSATION
FUJIME, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1966, 5 (09) : 764 - &
[10] QUANTITATIVE TREATMENT OF MULTIPLE SCATTERING EFFECT IN CONTINUOUS ELECTRON DIFFRACTION CURVES
GJONNES, J
[J]. ACTA CRYSTALLOGRAPHICA, 1959, 12 (12): : 976 - 980

← 1 2 3 4 →