PREPARATION OF ALUMINUM BASED ICOSAHEDRAL THIN-FILMS BY HIGH-TEMPERATURE VAPOR-DEPOSITION

被引:21
作者
CSANADY, A
BARNA, PB
MAYER, J
URBAN, K
机构
[1] HUNGARIAN ACAD SCI, INST TECH PHYS, H-1325 BUDAPEST, HUNGARY
[2] MAX PLANCK INST MET RES, D-7000 STUTTGART 80, FED REP GER
[3] FORSCHUNGSZENTRUM JULICH, INST FESTKORPERFORSCH, D-5170 JULICH 1, FED REP GER
来源
SCRIPTA METALLURGICA | 1987年 / 21卷 / 11期
关键词
CRYSTALS; -; Symmetry;
D O I
10.1016/0036-9748(87)90296-1
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
The authors report on the first observation of the direct formation of the icosahedral phase by simple vapour deposition of transition metals onto a heated aluminium thin film substrate. The films were deposited on amorphous carbon foils spread on molybdenum microgrids which are available as test specimens for electron microscopy. The target temperatures were 525 K, 575 K and 625 K. The results are compared to those obtained from melt spun samples of the same composition and to the data tabulated by Bancel et al.
引用
收藏
页码:1535 / 1540
页数:6
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