4-POINT ELECTRICAL MEASUREMENT TECHNIQUE FOR CHARACTERIZING MASK SUPERPOSITION ERRORS ON SEMICONDUCTOR WAFERS

被引：53

作者：

PERLOFF, DS

机构：

来源：

关键词：

D O I：

10.1109/JSSC.1978.1051074

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：436 / 444

页数：9

共 11 条

[1]

Daniel C., 1971, FITTING EQUATIONS DA

[2]

GEGENWARTH RE, 1977, APR P SPIE SEM DEV S

[3]

KISKER D, 1977, OCT P KOD MICR SEM M

[4] ANALYSIS OF SUPERPOSITION ERRORS IN WAFER FABRICATION [J].

MATSUZAWA, T ;

SUNAMI, H ;

HASHIMOTO, N .

MICROELECTRONICS AND RELIABILITY, 1977, 16 (02) :173-176

[5]

PERLOFF DS, 1977, SOLID STATE TECHNOL, V20, P31

PERLOFF, DS ;

WAHL, FE ;

CONRAGAN, J .

[7]

PERLOFF DS, 1976, 7TH P INT C EL ION B

[8]

PERLOFF DS, UNPUBLISHED

[9]

RUSSELL TJ, 1977, DEC C NOT INT EL DEV

[10]

THOMAS DR, 1974, NOV DIG PAP GOVT MIC