FREEZING OF THE 2X1 STRUCTURE AT COMMENSURATE AG(100)-SI(100) INTERFACE

被引:21
作者
KIMURA, Y
TAKAYANAGI, K
机构
[1] Department of Materials Science and Engineering, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Midori-ku, Yokohama, 227, Nagatsuta
关键词
D O I
10.1016/0039-6028(92)90705-B
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The growth process of Ag on the Si(100)2 x 1 surface is observed in situ by high-resolution reflection electron microscopy (HR-REM). A silver layer covers the Si(100) surface entirely at 1.5 ML (I ML = 6.78 x 10(14) atoms/cm2). Above 1.5 ML deposition, two-dimensional Ag islands are grown on the Ag layer of 1.5 ML at room temperature, while no islands are nucleated and grown on the layer at 480-degrees-C. Moire fringes appeared at the Ag islands seen in the HR-REM images and RHEED patterns show that the Ag islands after 3 ML deposition form a film with the (100) orientation and their (011) lattice planes are strained by 0.7% to be commensurate with the (011) Si lattice. The 2 x 1 structures of the Si(100) substrate are frozen at the Ag-Si interface, since the bright and dark contrast of the 2 x 1 domains of the clean surface is maintained.
引用
收藏
页码:166 / 173
页数:8
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