SUPERIOR MICROWAVE PROPERTIES BY POSTANNEALING YBA2CU3O7 THIN-FILMS AT LOW OXYGEN PARTIAL-PRESSURE

被引：18

作者：

MOGROCAMPERO, A ^{[1
]}

TURNER, LG ^{[1
]}

KADIN, AM ^{[1
]}

MALLORY, DS ^{[1
]}

机构：

[1] UNIV ROCHESTER,DEPT ELECT ENGN,ROCHESTER,NY 14627

来源：

APPLIED PHYSICS LETTERS | 1992年 / 60卷 / 26期

关键词：

D O I：

10.1063/1.106676

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

YBa2Cu3O7 (YBCO) thin films with improved properties have been recently reported by post-annealing in a low partial pressure of oxygen, similar to that used by in situ methods, compared to the usual post-annealing in 1 atm of oxygen. Here it is shown that the improvements extend to the microwave surface resistance. The surface resistance was measured at close to 10 GHz; the scaled value at 10 GHz and at 77 K is 240-mu-OMEGA. This value is as low as has been reported for YBCO thin films measured around 10 GHz made by any method, and is two orders of magnitude lower than the surface resistance of copper at the same temperature and frequency.

引用

页码：3310 / 3312

页数：3

共 13 条

[1] EFFECT OF THE POST-DEPOSITION PROCESSING AMBIENT ON THE PREPARATION OF SUPERCONDUCTING YBA2CU3O7-X COEVAPORATED THIN-FILMS USING A BAF2 SOURCE
CHAN, SW
BAGLEY, BG
GREENE, LH
GIROUD, M
FELDMANN, WL
JENKIN, KR
WILKINS, BJ
[J]. APPLIED PHYSICS LETTERS, 1988, 53 (15) : 1443 - 1445
[2] EFFECT OF OXYGEN-PRESSURE ON THE SYNTHESIS OF YBA2CU3O7-X THIN-FILMS BY POSTDEPOSITION ANNEALING
FEENSTRA, R
LINDEMER, TB
BUDAI, JD
GALLOWAY, MD
[J]. JOURNAL OF APPLIED PHYSICS, 1991, 69 (09) : 6569 - 6585
[3] IMPROVED BARIUM FLUORIDE PROCESS YBA2CU3O7-X FILMS VIA POST-ANNEAL MONITORING
GARZON, FH
RAISTRICK, ID
BROWN, DR
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1992, 21 (05) : 483 - 485
[4] SINGLE SOURCE METALORGANIC CHEMICAL VAPOR-DEPOSITION OF LOW MICROWAVE SURFACE-RESISTANCE YBA2CU3O7
HISKES, R
DICAROLIS, SA
YOUNG, JL
LADERMAN, SS
JACOWITZ, RD
TABER, RC
[J]. APPLIED PHYSICS LETTERS, 1991, 59 (05) : 606 - 607
[5] MICROWAVE PROPERTIES OF HIGHLY ORIENTED YBA2CU3O7-X THIN-FILMS
INAM, A
WU, XD
NAZAR, L
HEGDE, MS
ROGERS, CT
VENKATESAN, T
SIMON, RW
DALY, K
PADAMSEE, H
KIRCHGESSNER, J
MOFFAT, D
RUBIN, D
SHU, QS
KALOKITIS, D
FATHY, A
PENDRICK, V
BROWN, R
BRYCKI, B
BELOHOUBEK, E
DRABECK, L
GRUNER, G
HAMMOND, R
GAMBLE, F
LAIRSON, BM
BRAVMAN, JC
[J]. APPLIED PHYSICS LETTERS, 1990, 56 (12) : 1178 - 1180
[6] THICKNESS AND ANNEALING DEPENDENCE OF THE SUPERCONDUCTING TRANSITION-TEMPERATURE OF YBA2CU3O7-X THIN-FILMS ON OXIDIZED SILICON AND POLYCRYSTALLINE ALUMINA SUBSTRATES
MOGROCAMPERO, A
TURNER, LG
KENDALL, G
[J]. APPLIED PHYSICS LETTERS, 1988, 53 (25) : 2566 - 2568
[7] LOWER TEMPERATURE POSTANNEALING OF THIN-FILMS OF YBA2CU3O7 AT LOWER OXYGEN PARTIAL-PRESSURE
MOGROCAMPERO, A
TURNER, LG
[J]. APPLIED PHYSICS LETTERS, 1991, 58 (04) : 417 - 418
[8] OPTIMIZATION OF ANNEALING TEMPERATURE FOR YBA2CU3O7 THIN-FILMS POSTANNEALED AT A LOW OXYGEN PARTIAL-PRESSURE
MOGROCAMPERO, A
TURNER, LG
[J]. JOURNAL OF SUPERCONDUCTIVITY, 1991, 4 (04): : 279 - 282
[9] HIGH-QUALITY THIN-FILMS OF YBA2CU3O7 BY POSTANNEALING AT LOW OXYGEN PARTIAL-PRESSURE
MOGROCAMPERO, A
TURNER, LG
[J]. PHYSICA C, 1991, 176 (4-6): : 429 - 432
[10] MOGROCAMPERO A, IN PRESS J SUPERCOND

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