SECONDARY ION MASS-SPECTROMETRIC STUDY OF SELF-SPUTTERED COPPER

It is the purpose of the paper to discuss several new and interesting results which show how the secondary ion emission signal varies with fluence even for self bombardment of copper surfaces by copper ions. For the investigation a novel SIMS collector system was constructed. Its action is based on the conventional mirror-field geometry used for steering intense ion beams**9 and it allows the target to be optically screened from the quadrupole mass-filter used for analysis while at the same time, allowing a significant fraction of secondary ions to be collected. As a precaution against the results being peculiar to this particular design of secondary ion analyser samples were also analysed in a conventional SIMS apparatus comprising an energy filter and magnetic analyser section. Again it was shown that the interesting features of the influence of previous ion beam treatment on secondary ion results were produced.