MODELING OF SELF-LIMITING LASER-ABLATION OF ROUGH SURFACES - APPLICATION TO THE POLISHING OF DIAMOND FILMS

被引：52

作者：

TOKAREV, VN ^{[1
]}

WILSON, JIB ^{[1
]}

JUBBER, MG ^{[1
]}

JOHN, P ^{[1
]}

MILNE, DK ^{[1
]}

机构：

[1] HERIOT WATT UNIV,DEPT CHEM,EDINBURGH EH14 4AS,MIDLOTHIAN,SCOTLAND

来源：

关键词：

POLYCRYSTALLINE DIAMOND FILMS; LASER IRRADIATION; PROCESSING - MICROSTRUCTURE RELATIONS; SCANNING ELECTRON MICROSCOPY;

D O I：

10.1016/0925-9635(94)00241-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present a theoretical model for the interaction of excimer laser radiation with rough polycrystalline CVD diamond films, showing the influence of angle of incidence, irradiation intensity and number of laser pulses. A new regime of laser treatment self-limiting laser ablation - was found, which allows faceted films to be smoothed without wasteful ablation of the bulk. Multipulse XeCl laser (308 nm) irradiation of our diamond films, grown on silicon wafers, confirms that such polishing is accomplished.

引用

页码：169 / 176

页数：8

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