SILICON OXIDATION STUDIES - MEASUREMENT OF THE DIFFUSION OF OXIDANT IN SIO2-FILMS

被引:26
作者
IRENE, EA
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D O I
10.1149/1.2123870
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O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:413 / 417
页数:5
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