SILICON OXIDATION STUDIES - MEASUREMENT OF THE DIFFUSION OF OXIDANT IN SIO2-FILMS

被引：26

作者：

IRENE, EA

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 02期

关键词：

D O I：

10.1149/1.2123870

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：413 / 417

页数：5

共 28 条

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[2]

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[6]

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[8]

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YOUNG, L .

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[10] Silicon Oxidation Studies: The Role of H2O [J].

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