LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF POLYCRYSTALLINE SI FROM SICL4

[1] GENERAL EQUATIONS FOR GAS PHASE COMPOSITIONS IN EPITAXIAL FLOW SYSTEMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (06) : 1026 - &

[2] Carslow HS, 1959, CONDUCTION HEAT SOLI

[3] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[4] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[5] GUPTA DC, 1971, SOLID STATE TECHNOL, V14, P33

[6] LASER-INDUCED VAPOR-DEPOSITION OF SILICON [J]. APPLIED PHYSICS LETTERS, 1979, 35 (08) : 626 - 627

[7] EQUILIBRIUM BEHAVIOR OF SILICON-HYDROGEN-CHLORINE SYSTEM [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) : 460 - &

[8] HEATING AND MELTING OF A FILM ON A SUBSTRATE [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (09) : 4204 - 4208

[9] Tietjen J. J., 1973, ANNUAL REV MATERIALS, V3, P317

[1] GENERAL EQUATIONS FOR GAS PHASE COMPOSITIONS IN EPITAXIAL FLOW SYSTEMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (06) : 1026 - &

[2] Carslow HS, 1959, CONDUCTION HEAT SOLI

[3] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[4] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[5] GUPTA DC, 1971, SOLID STATE TECHNOL, V14, P33

[6] LASER-INDUCED VAPOR-DEPOSITION OF SILICON [J]. APPLIED PHYSICS LETTERS, 1979, 35 (08) : 626 - 627

[7] EQUILIBRIUM BEHAVIOR OF SILICON-HYDROGEN-CHLORINE SYSTEM [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) : 460 - &

[8] HEATING AND MELTING OF A FILM ON A SUBSTRATE [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (09) : 4204 - 4208

[9] Tietjen J. J., 1973, ANNUAL REV MATERIALS, V3, P317