FACTORS AFFECTING GROWTH RATE OF PLASMA ANODIZED AL203

[1] THE OPERATION OF LANGMUIR PROBES IN ELECTRO-NEGATIVE PLASMAS [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1959, 252 (1268): : 102 - 119

[2] IONIC CURRENT AND FILM GROWTH OF THIN OXIDE LAYERS ON ALUMINIUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (400): : 317 - 329

[3] FOPIANO PJ, 1965, IEEE T PARTS MATERIA, VPMP1, pS217

[4] HARKNESS AC, 1966, CAN J CHEM, V94, P2409

[5] SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES [J]. APPLIED PHYSICS LETTERS, 1968, 12 (02) : 25 - &

[6] JENNINGS TA, 1969, MAY SPRING M EL SOC, P53

[7] PREPARATION AND PROPERTIES OF CLEAN SURFACES OF ALUMINUM [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (11) : 2155 - &

[8] THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1240 - 1245

[9] PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02): : 330 - &

[10] PLASMA ANODIZED ALUMINUM OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (12) : 1368 - 1372

[1] THE OPERATION OF LANGMUIR PROBES IN ELECTRO-NEGATIVE PLASMAS [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1959, 252 (1268): : 102 - 119

[2] IONIC CURRENT AND FILM GROWTH OF THIN OXIDE LAYERS ON ALUMINIUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (400): : 317 - 329

[3] FOPIANO PJ, 1965, IEEE T PARTS MATERIA, VPMP1, pS217

[4] HARKNESS AC, 1966, CAN J CHEM, V94, P2409

[5] SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES [J]. APPLIED PHYSICS LETTERS, 1968, 12 (02) : 25 - &

[6] JENNINGS TA, 1969, MAY SPRING M EL SOC, P53

[7] PREPARATION AND PROPERTIES OF CLEAN SURFACES OF ALUMINUM [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (11) : 2155 - &

[8] THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1240 - 1245

[9] PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02): : 330 - &

[10] PLASMA ANODIZED ALUMINUM OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (12) : 1368 - 1372