ANALYSIS OF SPUTTERING DISCHARGE BY OPTICAL AND MASS-SPECTROMETRY .1. PLATINUM AND TANTALUM SPUTTERED IN ARGON

被引：27

作者：

WESTWOOD, WD ^{[1
]}

BOYNTON, RJ ^{[1
]}

机构：

[1] BELL NO RES LTD,OTTAWA,ONTARIO,CANADA

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 06期

关键词：

D O I：

10.1063/1.1662622

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：2610 / 2618

页数：9

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[15] STRUCTURAL AND ELECTRICAL PROPERTIES OF TANTALUM FILMS SPUTTERED IN OXYGEN-ARGON MIXTURES
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[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) : 2946 - +
[16] EFFECTS OF ARGON PRESSURE ON PROPERTIES OF SPUTTERED TANTALUM FILMS
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[J]. THIN SOLID FILMS, 1973, 16 (01) : 1 - 25
[17] CATHODE DARK-SPACE MEASUREMENTS AND DEPOSITION RATES OF TANTALUM IN A SPUTTERING SYSTEM
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