STRUCTURAL AND ELECTRICAL PROPERTIES OF TANTALUM FILMS SPUTTERED IN OXYGEN-ARGON MIXTURES

被引：36

作者：

WESTWOOD, WD

WATERHOUSE, N

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 07期

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D O I：

10.1063/1.1660653

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2946 / +

页数：1

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