STRUCTURAL, ELECTRICAL, AND OPTICAL PROPERTIES OF AMORPHOUS GERMANIUM FILMS

被引：183

作者：

CHOPRA, KL

BAHL, SK

机构：

来源：

PHYSICAL REVIEW B | 1970年 / 1卷 / 06期

关键词：

D O I：

10.1103/PhysRevB.1.2545

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：2545 / &

共 69 条

[1] EFFECT OF DEPOSITION PARAMETERS ON CRYSTALLINITY OF EVAPORATED GERMANIUM FILMS [J].

ADAMSKY, RF .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) :4301-&

[2] EFFECT OF OXYGEN ON FORMATION OF GERMANIUM FILMS [J].

ADAMSKY, RF ;

BEHRNDT, KH ;

BROGAN, WT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :542-&

[3] DIELECTRIC PROPERTIES OF THIN FILMS OF ALUMINIUM OXIDE AND SILICON OXIDE [J].

ARGALL, F ;

JONSCHER, AK .

THIN SOLID FILMS, 1968, 2 (03) :185-&

[4] AMORPHOUS VERSUS CRYSTALLINE GETE FILMS .2. OPTICAL PROPERTIES [J].

BAHL, SK ;

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (12) :4940-&

[5]

BAHL SK, TO BE PUBLISHED

[6]

BANYAI L, 1964, 1964 P INT C PHYS SE, P417

[7] SOLID AMORPHOUS GE AND AS AS EXAMPLES OF LATTICE-LIKE AMORPHOUS SUBSTANCES [J].

BREITLING, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :628-+

[8] ELECTRON SPIN RESONANCE IN AMORPHOUS SILICON, GERMANIUM, AND SILICON CARBIDE [J].

BRODSKY, MH ;

TITLE, RS .

PHYSICAL REVIEW LETTERS, 1969, 23 (11) :581-&

[9]

Chopra K. L., 1969, THIN FILM PHENOMENA

[10] AMORPHOUS VERSUS CRYSTALLINE GETE FILMS .I. GROWTH AND STRUCTURAL BEHAVIOR [J].

CHOPRA, KL ;

BAHL, SK .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (10) :4171-&

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