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K-X-RAY SPECTRA OF AMORPHOUS AND CRYSTALLINE SILICON

被引：21
作者：
SENEMAUD, C
COSTALIMA, MT
机构：
[1] Laboratoire de Chimie Physique, 11, rue Pierre et Marie Curie
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1979年 / 33卷 / 02期
关键词：
D O I：
10.1016/0022-3093(79)90044-9
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
K X-ray emission and absorption spectra of crystalline and amorphous silicon have been analysed and compared to band structure calculations. The experimental results confirm the influence of rings and bound-angle fluctuations on different regions of the valence and conduction band of amorphous silicon. © 1979.
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页码：141 / 148
页数：8
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