HIGH-RATE PHOTORESIST STRIPPING IN AN OXYGEN AFTERGLOW

被引：42

作者：

SPENCER, JE ^{[1
]}

BOREL, RA ^{[1
]}

机构：

[1] PENN STATE UNIV,DEPT ELECT ENGN,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 09期

关键词：

D O I：

10.1149/1.2109050

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1922 / 1925

页数：4

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