VLSI METALLIZATION - SOME PROBLEMS AND TRENDS

被引：21

作者：

VOSSEN, JL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 03期

关键词：

D O I：

10.1116/1.571146

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：761 / 765

页数：5

共 69 条

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