COMMENT ON CHEMICAL NATURE OF PHOSPHORUS IN NI-P DEPOSITS

被引：4

作者：

PAI, ST

MARTON, JP

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 11期

关键词：

D O I：

10.1063/1.1661033

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4836 / &

共 13 条

[1] STRUCTURE OF CHEMICALLY DEPOSITED NICKEL [J].

GOLDENSTEIN, AW ;

ROSTOKER, W ;

SCHOSSBERGER, F ;

GUTZEIT, G .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (02) :104-110

[2] STRUCTURE OF ELECTROLESS NICKEL [J].

GRAHAM, AH ;

LINDSAY, RW ;

READ, HJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) :1200-1201

[3] STRUCTURE AND MECHANICAL PROPERTIES OF ELECTROLESS NICKEL [J].

GRAHAM, AH ;

LINDSAY, RW ;

READ, HJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) :401-&

[4] NUCLEATION GROWTH AND STRUCTURE OF THIN NI-P FILMS [J].

MARTON, JP ;

SCHLESINGER, M .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (01) :16-+

[5]

MARTON JP, 1967, 1037 WELW CAN LTD RE

[6] ANNEALING EFFECTS ON STRUCTURE AND RESISTIVITY OF NI-P FILMS [J].

PAI, ST ;

BROWN, JD ;

MARTON, JP .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (02) :282-&

[7]

RANDIN JP, 1970, J ELECTROCHEM SOC, V117, P160

[8] CHEMICAL NATURE OF PHOSPHORUS IN NI-P DEPOSITS [J].

RANDIN, JP .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (11) :4834-&

[9] EVIDENCE OF NICKEL PHOSPHIDE NI2P IN AS-PLATED ELECTROLESS NICKEL [J].

RANDIN, JP ;

HINTERMANN, HE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (05) :480-+

[10] DTA AND X-RAY STUDIES OF ELECTROLESS NICKEL [J].

RANDIN, JP ;

MAIRE, PA ;

SAURER, E ;

HINTERMANN, HE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (05) :442-+

← 1 2 →