STRUCTURAL, OPTICAL, AND DIELECTRIC PROPERTIES OF REACTIVELY SPUTTERED FILMS IN SYSTEM AIN-BN

被引：28

作者：

NOREIKA, AJ

FRANCOMBE, MH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.1315741

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：722 / +

页数：1

共 15 条

[1] ELECTRONIC BAND STRUCTURE OF GROUP IV ELEMENTS AND OF III-V COMPOUNDS
BASSANI, F
YOSHIMINE, M
[J]. PHYSICAL REVIEW, 1963, 130 (01): : 20 - &
[2] CHU TL, 1968, ELECTROCHEM TECHNOL, V6, P56
[3] ON PREPARATION OPTICAL PROPERTIES AND ELECTRICAL BEHAVIOUR OF ALUMINIUM NITRIDE
COX, GA
CUMMINS, DO
KAWABE, K
TREDGOLD, RH
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (04) : 543 - &
[4] STRUCTURAL AND OPTICAL EVALUATION OF VACUUM-DEPOSITED GAP FILMS
DAVEY, JE
PANKEY, T
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 212 - &
[5] STRUCTURAL + OPTICAL CHARACTERISTICS OF THIN GAAS FILMS
DAVEY, JE
PANKEY, T
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (07) : 2203 - &
[6] FRANZ W, 1958, Z NATURFORSCH PT A, V13, P484
[7] HABERECHT RR, 1964, INSULATION, V10, P33
[8] KELDYSH LV, 1958, ZH EKSP TEOR FIZ, V34, P1138
[9] INFRARED ABSORPTION OF SILICON NEAR THE LATTICE EDGE
MACFARLANE, GG
ROBERTS, V
[J]. PHYSICAL REVIEW, 1955, 98 (06): : 1865 - 1866
[10] DIELECTRIC PROPERTIES OF REACTIVELY SPUTTERED FILMS OF ALUMINUM NITRIDE
NOREIKA, AJ
FRANCOMBE, MH
ZEITMAN, SA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 194 - +