CHEMICAL MODIFICATION OF INSULATORS BY ION-IMPLANTATION, FUNDAMENTAL MECHANISMS AND ASTROPHYSICAL IMPLICATIONS

被引:28
作者
ROSSLER, K
机构
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1986年 / 99卷 / 1-4期
关键词
D O I
10.1080/00337578608209613
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
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页码:21 / 70
页数:50
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