PLASTIC-FLOW DURING THERMAL-OXIDATION OF SILICON

被引：44

作者：

RAFFERTY, CS ^{[1
]}

BORUCKI, L ^{[1
]}

DUTTON, RW ^{[1
]}

机构：

[1] IBM CORP,GTD DIV,ESSEX JUNCTION,VT 05452

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 16期

关键词：

D O I：

10.1063/1.101384

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1516 / 1518

页数：3

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