TIOX AL2O3 MULTILAYER CERAMIC THIN-FILMS

被引：6

作者：

ALEXANDER, KB

WALKER, FJ

MCKEE, RA

LIST, FA

机构：

[1] Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1990年 / 73卷 / 06期

关键词：

alumina; coatings; films; multilayer; titania;

D O I：

10.1111/j.1151-2916.1990.tb09822.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Titanium oxide/aluminum oxide films have been deposited using molecular beam epitaxy methods and characterized by reflection high‐energy electron diffraction and transmission electron microscopy techniques. Growth on silicon substrates below 973 K resulted in primarily amorphous multilayers. At 1323 K, the deposition of titanium in an oxygen atmosphere on (0001) Al2O3 substrates resulted in films of Ti2O3. These films consisted of small domains, up to 60 nm, slightly misoriented from a [1120] ∥ [1120] orientation relationship. Two variants of Ti2O3 were observed due to multiple positioning during growth. Closing the titanium shutter during growth resulted in an oriented TiO2 film. Copyright © 1990, Wiley Blackwell. All rights reserved

引用

页码：1737 / 1743

页数：7

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