X-RAY PHOTOELECTRON-SPECTROSCOPY ANALYSIS OF POLYIMIDE FILMS MODIFIED BY ULTRAVIOLET PULSED-LASER RADIATION AT 193 NM

被引：13

作者：

BREZINI, A

ZEKRI, N

机构：

[1] International Center for Theoretical Physics, Trieste

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 75卷 / 04期

关键词：

D O I：

10.1063/1.356301

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Polyimide films were treated in air with an argon-fluorine ultraviolet excimer laser (lambda = 193 nm). X-rav photoelectron spectroscopy analysis was performed on the modified surfaces after laser exposure at various fluences around the expected threshold fluence F(th). From the present data the photochemical process (photoablation) leads to produce a carbon-rich surface by ejecting mainly oxides of carbon and nitrogen compounds above a particular fluence F(e).

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页码：2015 / 2019

页数：5

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