SELF-ENERGY EFFECTS ON THE SURFACE-STATE ENERGIES OF H-SI(111)1X1

被引:69
作者
BLASE, X
ZHU, XJ
LOUIE, SG
机构
[1] LAWRENCE BERKELEY LAB,DIV MAT SCI,BERKELEY,CA 94720
[2] AT&T BELL LABS,MURRAY HILL,NJ 07974
来源
PHYSICAL REVIEW B | 1994年 / 49卷 / 07期
关键词
D O I
10.1103/PhysRevB.49.4973
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have calculated the quasiparticle energy of the occupied surface states of the H-Si(111)1x1 surface. The electron self-energy operator is expanded to first order in the screened Coulomb interaction in the GW approximation. The results explain the data from recent high-resolution angle-resolved photoemission spectroscopy. Comparison of the quasiparticle surface-state energies with those from local-density-functional eigenvalues shows that the self-energy corrections are very large, typically two to three times larger than the corrections found in previous calculations on other semiconductor surface systems. We have also performed a frozen-phonon study of the stretching mode of the Si-H bond. As observed in several recent experiments and theoretical studies, a large anharmonicity is found.
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页码:4973 / 4980
页数:8
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