CHEMICAL DEPOSITION OF MO ON SI

被引：26

作者：

SUGANO, T

CHOU, HK

YOSHIDA, M

NISHI, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1968年 / 7卷 / 09期

关键词：

D O I：

10.1143/JJAP.7.1028

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1028 / &

共 13 条

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