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IMAGE FORCES AND BEHAVIOR OF MOBILE POSITIVE-IONS IN SILICON DIOXIDE
被引:50
作者
:
WILLIAMS, R
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
WILLIAMS, R
[
1
]
WOODS, MH
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
WOODS, MH
[
1
]
机构
:
[1]
RCA LABS, PRINCETON, NJ 08540 USA
来源
:
APPLIED PHYSICS LETTERS
|
1973年
/ 22卷
/ 09期
关键词
:
D O I
:
10.1063/1.1654711
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:458 / 459
页数:2
相关论文
共 17 条
[1]
APPLICATION OF TRIANGULAR VOLTAGE SWEEP METHOD TO MOBILE CHARGE STUDIES IN MOS STRUCTURES
CHOU, NJ
论文数:
0
引用数:
0
h-index:
0
CHOU, NJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(04)
: 601
-
&
[2]
BARRIER INHOMOGENEITIES ON A SI-SIO2 INTERFACE BY SCANNING INTERNAL PHOTOEMISSION
DISTEFAN.TH
论文数:
0
引用数:
0
h-index:
0
DISTEFAN.TH
[J].
APPLIED PHYSICS LETTERS,
1971,
19
(08)
: 280
-
&
[3]
HARNWELL GP, 1938, PRINCIPLES ELECTRICI
[4]
SPACE-CHARGE-LIMITED IONIC CURRENTS IN SILICON DIOXIDE FILMS
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
APPLIED PHYSICS LETTERS,
1967,
10
(10)
: 291
-
+
[5]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 222
-
+
[6]
PROTON AND SODIUM TRANSPORT IN SIO2 FILMS
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1967,
ED14
(11)
: 749
-
+
[7]
NEUTRALIZATION OF NA+ IONS IN HCL-GROWN SIO2
KRIEGLER, RJ
论文数:
0
引用数:
0
h-index:
0
KRIEGLER, RJ
[J].
APPLIED PHYSICS LETTERS,
1972,
20
(11)
: 449
-
&
[8]
IONIC CONTAMINATION AND TRANSPORT OF MOBILE IONS IN MOS STRUCTURES
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
SILVERSMITH, DJ
论文数:
0
引用数:
0
h-index:
0
SILVERSMITH, DJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(06)
: 966
-
+
[9]
MOTT NF, 1958, THEORY PROPERTIES ME, P87
[10]
MOTT NF, 1950, ELECTRONIC PROCESSIN, P170
←
1
2
→
共 17 条
[1]
APPLICATION OF TRIANGULAR VOLTAGE SWEEP METHOD TO MOBILE CHARGE STUDIES IN MOS STRUCTURES
CHOU, NJ
论文数:
0
引用数:
0
h-index:
0
CHOU, NJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(04)
: 601
-
&
[2]
BARRIER INHOMOGENEITIES ON A SI-SIO2 INTERFACE BY SCANNING INTERNAL PHOTOEMISSION
DISTEFAN.TH
论文数:
0
引用数:
0
h-index:
0
DISTEFAN.TH
[J].
APPLIED PHYSICS LETTERS,
1971,
19
(08)
: 280
-
&
[3]
HARNWELL GP, 1938, PRINCIPLES ELECTRICI
[4]
SPACE-CHARGE-LIMITED IONIC CURRENTS IN SILICON DIOXIDE FILMS
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
APPLIED PHYSICS LETTERS,
1967,
10
(10)
: 291
-
+
[5]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 222
-
+
[6]
PROTON AND SODIUM TRANSPORT IN SIO2 FILMS
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1967,
ED14
(11)
: 749
-
+
[7]
NEUTRALIZATION OF NA+ IONS IN HCL-GROWN SIO2
KRIEGLER, RJ
论文数:
0
引用数:
0
h-index:
0
KRIEGLER, RJ
[J].
APPLIED PHYSICS LETTERS,
1972,
20
(11)
: 449
-
&
[8]
IONIC CONTAMINATION AND TRANSPORT OF MOBILE IONS IN MOS STRUCTURES
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
SILVERSMITH, DJ
论文数:
0
引用数:
0
h-index:
0
SILVERSMITH, DJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(06)
: 966
-
+
[9]
MOTT NF, 1958, THEORY PROPERTIES ME, P87
[10]
MOTT NF, 1950, ELECTRONIC PROCESSIN, P170
←
1
2
→