DEPENDENCE OF ION-MATRIX DOSE ON DENSITY FOR PLANAR, CYLINDRICAL, AND SPHERICAL ELECTRODES

Ion-matrix dose dependence calculations for plasma source ion implantation in planar, cylindrical, and spherical geometries are presented. It is demonstrated that in the high plasma density limit (in relation to the applied electrode potential and electrode size), the spherical and cylindrical cases approach the planar case. However, in the low relative density limit, the density dependencies diverge with the dependence vanishing for the spherical case, remaining unchanged for the planar case, and with the cylindrical case lying between the previous two. © 1994 American Institute of Physics.