ELECTRON-MICROSCOPE STRUCTURE AND INTERNAL-STRESS IN THIN SILVER AND GOLD-FILMS DEPOSITED ONTO MGF2 AND SIO SUBSTRATES

In this work the internal stress of thin silver and gold films deposited onto MgF2 and SiO substrate films was measured up to a mean thickness of about 1000 Å. The method used was based on the cantilever beam principle. The internal stress of the metal films was determined by subtracting the contributions due to momentum transfer and heat transfer. From parallel electron microscope investigations of films of various thicknesses it was seen that a close correlation exists between the internal stress generated in the films and their structure. On the basis of these results we propose a model which gives a qualitative explanation of the measured internal stress versus thickness curves and of their dependence on vacuum conditions, evaporation rate and the nature of the substrate. © 1979.